Low-temperature atmospheric discharge plasma and its applications for the surface treatment

Abstract The atmospheric pressure low-temperature homogeneous discharge using helium and nitrogen, both known for industrial applications, was reviewed. In case of helium, metastable atoms (2 1 s 2 3 s) produced in the glow were able to dissociate mixed molecular gases produce radicals or atoms. Radical species undergo chemical reactions, such as oxidation nitration reaction form products on electrode surfaces. Applications including surface treatment plastic films enhance adhesibility with glue, weakening strength pressure-sensitive deposition solid material a flat plate powder surfaces, described. Moreover, microwave cost-saving carrier gas, introduced cleaning silicon wafer.